Fontaine, Bruno: search on Z-Library

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1

Implied volatility and skewness surface

Feunou, Bruno, Fontaine, Jean-Sébastien, Tédongap, Roméo

Journal:

Review of Derivatives Research

Year:

2017

Language:

english

File:

PDF, 931 KB

english, 2017

2

Beyond species richness and biomass: Impact of selective logging and silvicultural treatments on the functional composition of a neotropical forest

Yguel, Benjamin, Piponiot, Camille, Mirabel, Ariane, Dourdain, Aurelie, Hérault, Bruno, Gourlet-Fleury, Sylvie, Forget, Pierre-Michel, Fontaine, Colin

Journal:

Forest Ecology and Management

Year:

2019

Language:

english

File:

PDF, 300 KB

english, 2019

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Proposal for determining exposure latitude requirements

Levinson, Harry J., Ma, Yuansheng, Koenig, Marcel, La Fontaine, Bruno, Seltmann, Rolf

Year:

2008

Language:

english

File:

PDF, 371 KB

english, 2008

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Performance of the ASML EUV Alpha Demo Tool

Hermans, Jan V., Hendrickx, Eric, Laidler, David, Jehoul, Christiane, Van Den Heuvel, Dieter, Goethals, Anne-Marie, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 3.65 MB

english, 2010

5

Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling

Fomenkov, Igor, Brandt, David, Ershov, Alex, Schafgans, Alexander, Tao, Yezheng, Vaschenko, Georgiy, Rokitski, Slava, Kats, Michael, Vargas, Michael, Purvis, Michael, Rafac, Rob, La Fontaine, Bruno, D

Journal:

Advanced Optical Technologies

Language:

english

File:

PDF, 1.06 MB

english

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Towards defect free EUVL reticles: carbon and particle removal by single dry cleaning proces and pattern repair by HIM

Koster, N. B., La Fontaine, Bruno M., Naulleau, Patrick P., Molkenboer, F. T., van Veldhoven, E., Oostrom, S.

Year:

2011

Language:

english

File:

PDF, 19.54 MB

english, 2011

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Actinic phase defect detection and printability analysis for patterned EUVL mask

La Fontaine, Bruno M., Terasawa, Tsuneo, Yamane, Takeshi, Tanaka, Toshihiko, Suga, Osamu, Kamo, Takashi, Mori, Ichiro

Year:

2010

Language:

english

File:

PDF, 2.52 MB

english, 2010

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Polycarbonate based nonchemically amplified photoresists for extreme ultraviolet lithography

La Fontaine, Bruno M., Blakey, Idriss, Yu, Anguang, Blinco, James, Jack, Kevin S., Liu, Heping, Leeson, Michael, Yueh, Wang, Younkin, Todd, Whittaker, Andrew K.

Year:

2010

Language:

english

File:

PDF, 693 KB

english, 2010

9

Effect of nutrients availability and long-term tillage on priming effect and soil C mineralization

Dimassi, Bassem, Mary, Bruno, Fontaine, Sébastien, Perveen, Nazia, Revaillot, Sandrine, Cohan, Jean-Pierre

Journal:

Soil Biology and Biochemistry

Year:

2014

Language:

english

File:

PDF, 718 KB

english, 2014

10

Stability of organic carbon in deep soil layers controlled by fresh carbon supply

Fontaine, Sébastien, Barot, Sébastien, Barré, Pierre, Bdioui, Nadia, Mary, Bruno, Rumpel, Cornelia

Journal:

Year:

2007

Language:

english

File:

PDF, 257 KB

english, 2007

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Actinic imaging of native and programmed defects on a full-field mask

Mochi, I., Goldberg, K. A., La Fontaine, B., Tchikoulaeva, A., Holfeld, C., La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 3.46 MB

english, 2010

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Quantitative evaluation of mask phase defects from through-focus EUV aerial images

Mochi, Iacopo, La Fontaine, Bruno M., Naulleau, Patrick P., Goldberg, Kenneth A., Xie, Ryan, Yan, Pei-Yang, Yamazoe, Kenji

Year:

2011

Language:

english

File:

PDF, 3.97 MB

english, 2011

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection

La Fontaine, Bruno M., Huh, Sungmin, Ren, Liping, Chan, David, Wurm, Stefan, Goldberg, Kenneth, Mochi, Iacopo, Nakajima, Toshio, Kishimoto, Masahiro, Ahn, Byungsup, Kang, Inyong, Park, Joo-on, Cho, Ky

Year:

2010

Language:

english

File:

PDF, 977 KB

english, 2010

14

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Characterization of photo-acid redeposition in 193-nm photoresists

Wallow, Thomas, Lin, Qinghuang, Plat, Marina, Zhang, Zhanping, MacDonald, Brian, Bernard, Joffre, Romero, Jeremias, La Fontaine, Bruno, Levinson, Harry J.

Year:

2007

Language:

english

File:

PDF, 910 KB

english, 2007

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Directly patterned inorganic hardmask for EUV lithography

Stowers, Jason K., Telecky, Alan, Kocsis, Michael, Clark, Benjamin L., Keszler, Douglas A., Grenville, Andrew, Anderson, Chris N., Naulleau, Patrick P., La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 3.85 MB

english, 2011

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - EUV mask defect inspection and defect review strategies for EUV pilot line and high volume manufacturing

Chan, Y. David, Rastegar, Abbas, Yun, Henry, Putna, E. Steve, Wurm, Stefan, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 511 KB

english, 2010

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Time resolved studies of laser-produced plasmas of tin

La Fontaine, Bruno M., McCormack, T., Scally, E., Kambalii, I.

Year:

2010

Language:

english

File:

PDF, 1.95 MB

english, 2010

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

Putna, E. Steve, Younkin, Todd R., Leeson, Michael, Caudillo, Roman, Bacuita, Terence, Shah, Uday, Chandhok, Manish, La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 1.86 MB

english, 2011

19

Low-Burnup Irradiation Behavior of Fast Reactor Metal Fuels Containing Minor Actinides

Ohta, Hirokazu, Ogata, Takanari, Yokoo, Takeshi, Ougier, Michel, Glatz, Jean-Paul, Fontaine, Bruno, Breton, Laurent

Journal:

Nuclear Technology

Year:

2009

Language:

english

File:

PDF, 980 KB

english, 2009

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Absorption and loss of film thickness in photoresists and underlayer materials upon irradiation at 13.5 nm

La Fontaine, Bruno M., Ho, Grace H., Kang, Fu-H., Fu, Huang-W., Shih, Yu-H., Fung, Hok-S., Ku, Wan-P., Cheng, Yu-S., Wu, Pei-J.

Year:

2010

Language:

english

File:

PDF, 611 KB

english, 2010

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Physical resist models and their calibration: their readiness for accurate EUV lithography simulation

La Fontaine, Bruno M., Klostermann, U. K., Mülders, T., Schmöller, T., Lorusso, G. F., Hendrickx, E.

Year:

2010

Language:

english

File:

PDF, 1.30 MB

english, 2010

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Development of EUV resist for 22nm half pitch and beyond

Maruyama, Ken, Shimizu, Makoto, Hirai, Yuuki, Nishino, Kouta, Kimura, Tooru, Kai, Toshiyuki, Goto, Kentaro, Sharma, Shalini, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 722 KB

english, 2010

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - EUV flare and proximity modeling and model-based correction

Zuniga, Christian, Habib, Mohamed, Word, James, Lorusso, Gian F., Hendrickx, Eric, Baylav, Burak, Chalasani, Raghu, Lam, Michael, La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 3.56 MB

english, 2011

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Scissionable polymer resists for extreme ultraviolet lithography

Ogata, Yoichi, Masson, Georgeta, Hishiro, Yoshi, Blackwell, James M., La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 1.26 MB

english, 2010

25

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - EUV source development for AIMS and blank inspection

La Fontaine, Bruno M., Blackborow, Paul A., Partlow, Matthew J., Horne, Stephen F., Besen, Matthew M., Smith, Donald K., Gustafson, Deborah

Year:

2010

Language:

english

File:

PDF, 10.05 MB

english, 2010

26

Power Transmission Technologies and Solutions: The Latest Advances at RTE, the French Transmission System Operator

Meyer, Bruno, Straub, Clementine, Astic, Jean-Yves, Meyer, Pierre, Sardou, Francois-Xavier, Poumarede, Christian, Couturier, Nicolas, Fontaine, Mathieu, Lemaitre, Christian, Maeght, Jean

Journal:

IEEE Power and Energy Magazine

Year:

2020

File:

PDF, 336 KB

2020

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Development of resist material and process for hp-2x-nm devices using EUV lithography

Matsunaga, Kentaro, Oizumi, Hiroaki, Kaneyama, Koji, Shiraishi, Gousuke, Matsumaro, Kazuyuki, Santillan, Julius Joseph, Itani, Toshiro, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 6.85 MB

english, 2010

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Applicability of extreme ultraviolet lithography to fabrication of half pitch 35nm interconnects

La Fontaine, Bruno M., Aoyama, Hajime, Tanaka, Yuusuke, Tawarayama, Kazuo, Nakamura, Naofumi, Soda, Eiichi, Oda, Noriaki, Arisawa, Yukiyasu, Uno, Taiga, Kamo, Takashi, Matsunaga, Kentaro, Kawamura, Da

Year:

2010

Language:

english

File:

PDF, 4.46 MB

english, 2010

29

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Assessing out-of-band flare effects at the wafer level for EUV lithography

La Fontaine, Bruno M., George, Simi A., Naulleau, Patrick P., Kemp, Charles D., Denham, Paul E., Rekawa, Senajith

Year:

2010

Language:

english

File:

PDF, 5.36 MB

english, 2010

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Development of EUV lithography tools at Nikon

Murakami, Katsuhiko, La Fontaine, Bruno M., Naulleau, Patrick P., Oshino, Tetsuya, Kondo, Hiroyuki, Chiba, Hiroshi, Nomura, Kazushi, Kawai, Hidemi, Kohama, Yoshiaki, Morita, Kenji, Hada, Kazunari, Ohk

Year:

2011

Language:

english

File:

PDF, 6.42 MB

english, 2011

31

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - An investigation of EUV lithography defectivity

Cummings, Kevin D., Laursen, Thomas, Pierson, Bill, Han, Sang-in, Watso, Robert, van Dommelen, Youri, Lee, Brian, Deng, Yunfei, La Fontaine, Bruno, Wallow, Thomas, Okoroanyanwu, Uzo, Wood, Obert, Tchi

Year:

2008

Language:

english

File:

PDF, 2.14 MB

english, 2008

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Influence of mask surface roughness on 22nm node extreme ultraviolet lithography

La Fontaine, Bruno M., Kim, Eun-Jin, You, Jee-Hye, Kim, Seoung-Sue, Cho, Han-Ku, Ahn, Jinho, An, Ilsin, Oh, Hye-Keun

Year:

2010

Language:

english

File:

PDF, 2.76 MB

english, 2010

33

Passive measurement of NO2 and application of GIS to generate spatially-distributed air monitoring network in urban environment

Behera, Sailesh N., Sharma, Mukesh, Mishra, P.K., Nayak, Pranati, Damez-Fontaine, Bruno, Tahon, Renaud

Journal:

Year:

2015

Language:

english

File:

PDF, 3.36 MB

english, 2015

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Measuring resist-induced contrast loss using EUV interference lithography

La Fontaine, Bruno M., Langner, Andreas, Solak, Harun H., Gronheid, Roel, van Setten, Eelco, Auzelyte, Vaida, Ekinci, Yasin, van Ingen Schenau, Koen, Feenstra, Kees

Year:

2010

Language:

english

File:

PDF, 1.91 MB

english, 2010

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Overlay progress in EUV lithography towards adoption for manufacturing

Hermans, Jan V., Laidler, David, Pigneret, Charles, van Dijk, Andre, Voznyi, Oleg, Dusa, Mircea, Hendrickx, Eric, La Fontaine, Bruno M., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 2.84 MB

english, 2011

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Evaluation of EUV mask defect using blank inspection, patterned mask inspection, and wafer inspection

Kamo, Takashi, La Fontaine, Bruno M., Naulleau, Patrick P., Terasawa, Tsuneo, Yamane, Takeshi, Shigemura, Hiroyuki, Takagi, Noriaki, Amano, Tsuyoshi, Tawarayama, Kazuo, Nozoe, Mari, Tanaka, Toshihiko,

Year:

2011

Language:

english

File:

PDF, 8.44 MB

english, 2011

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Assessing EUV mask defectivity

La Fontaine, Bruno M., Okoroanyanwu, Uzodinma, Tchikoulaeva, Anna, Ackmann, Paul, Wood, Obert, La Fontaine, Bruno, Bubke, Karsten, Holfeld, Christian, Peters, Jan Hendrik, Kini, Sumanth, Watson, Sterl

Year:

2010

Language:

english

File:

PDF, 1.05 MB

english, 2010

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Optics for EUV production

Lowisch, Martin, Kuerz, Peter, Mann, Hans-Juergen, Natt, Oliver, Thuering, Bernd, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 1.81 MB

english, 2010

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Comprehensive EUV lithography model

Smith, Mark D., La Fontaine, Bruno M., Naulleau, Patrick P., Graves, Trey, Biafore, John, Robertson, Stewart, Kim, Cheolkyun, Moon, James, Kim, Jaeheon, Bok, Cheolkyu, Yim, Donggyu

Year:

2011

Language:

english

File:

PDF, 808 KB

english, 2011

40

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm

Goldberg, Kenneth A., La Fontaine, Bruno M., Naulleau, Patrick P., Mochi, Iacopo, Rekawa, Senajith B., Smith, Nathan S., Macdougall, James B., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 2.00 MB

english, 2011

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Durability of capped multilayer mirrors for high volume manufacturing extreme ultraviolet lithography tool

Matsunari, S., Schellenberg, Frank M., La Fontaine, Bruno M., Kakutani, Y., Aoki, T., Kawata, S., Murakami, K.

Year:

2009

Language:

english

File:

PDF, 981 KB

english, 2009

42

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - EUV masks under exposure: practical considerations

Gallagher, Emily, La Fontaine, Bruno M., Naulleau, Patrick P., McIntyre, Gregory, Wallow, Tom, Raghunathan, Sudharshanan, Wood, Obert, Kindt, Louis, Whang, John, Barrett, Monica

Year:

2011

Language:

english

File:

PDF, 444 KB

english, 2011

43

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Modeling the transfer of line edge roughness from an EUV mask to the wafer

Gallatin, Gregg M., La Fontaine, Bruno M., Naulleau, Patrick P., Naulleau, Patrick P.

Year:

2011

Language:

english

File:

PDF, 363 KB

english, 2011

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Coulomb blur advantage of a multi-shaped beam lithography approach

Slodowski, Matthias, Doering, Hans-Joachim, Elster, Thomas, Stolberg, Ines A., Schellenberg, Frank M., La Fontaine, Bruno M.

Year:

2009

Language:

english

File:

PDF, 1.16 MB

english, 2009

45

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - LPP EUV source readiness for NXE 3300B

Wood, Obert R., Panning, Eric M., Brandt, David C., Fomenkov, Igor V., Farrar, Nigel R., La Fontaine, Bruno, Myers, David W., Brown, Daniel J., Ershov, Alex I., Böwering, Norbert R., Riggs, Daniel J.,

Year:

2014

Language:

english

File:

PDF, 545 KB

english, 2014

46

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Characterization of electrostatic chucks for extreme ultraviolet lithography

Mulholland, Tom C., Schellenberg, Frank M., La Fontaine, Bruno M., Zeuske, Jacob R., Vukkadala, Pradeep, Engelstad, Roxann L.

Year:

2009

Language:

english

File:

PDF, 1.53 MB

english, 2009

47

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Printability and inspectability of programmed pit defects on the masks in EUV lithography

La Fontaine, Bruno M., Kang, In-Yong, Seo, Hwan-Seok, Ahn, Byung-Sup, Lee, Dong-Gun, Kim, Dongwan, Huh, Sungmin, Koh, Cha-Won, Cha, Brian, Kim, Seoung-Sue, Cho, Han-Ku, Mochi, Iacopo, Goldberg, Kennet

Year:

2010

Language:

english

File:

PDF, 2.26 MB

english, 2010

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Tin DPP source collector module (SoCoMo): status of Beta products and HVM developments

La Fontaine, Bruno M., Yoshioka, Masaki, Teramoto, Yusuke, Zink, Peter, Schriever, Guido, Niimi, Gota, Corthout, Marc

Year:

2010

Language:

english

File:

PDF, 8.23 MB

english, 2010

49

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Impact of mask line roughness in EUV lithography

Vaglio Pret, Alessandro, La Fontaine, Bruno M., Naulleau, Patrick P., Gronheid, Roel, Graves, Trey, Smith, Mark D., Biafore, John

Year:

2011

Language:

english

File:

PDF, 529 KB

english, 2011

50

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Development of the reliable 20 kW class pulsed carbon dioxide laser system for LPP EUV light source

Fujimoto, Junichi, La Fontaine, Bruno M., Naulleau, Patrick P., Ohta, Takeshi, Nowak, Krzysztof M., Suganuma, Takashi, Kameda, Hidenobu, Moriya, Masato, Yokoduka, Toshio, Fujitaka, Koji, Sumitani, Aki

Year:

2011

Language:

english

File:

PDF, 1.07 MB

english, 2011

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